FAQ

In principle, PVD allows the use of substrates of any material which is compatible with appropriate vacuum deposition processes (generally, delicate materials require delicate processes). X-PLATING has optimised its plants and processes to work on steel, brass and zamak.

Items in brass and zamak require a phase of galvanisation prior to PVD deposition. There are no additional steps required in the process where stainless steel is used. It is worth noting that the PVD layer mimics the surface of the item, so any polishing, satinising or sandblasting shoud be carried out before the deposition stage.

Even though PVD layers are extremely resistant to environmental chemical wear, the structure of deposition, by nature, presents the likelihood of the substrate experiencing corrosion. To avoid this problem, a galvanic barrier layer is applied from which it is possible, if requested, for the item to have a glossy finish.

PVD layering proposed by X-PLATING does not utilise any materials containing irritants or allergens. Furthermore, each developed finish is verified to ensure that the release of metallic by-products is within regulation limits. The majority of materials deposited are validated for application in the medical and food industries.

There are no limitations to the geometry of items to be layered, as long as their dimensions allow them to be inserted in the appropriate processing plant. It’s worth keeping in mind that the actual PVD deposition occurs in the line of fire. In other words, the layer increases only on the exposed surfaces.

The PVD plant consists of a vacuum chamber in which the deposition occurs. In this chamber, there is a carrousel on which items to be treated, are mounted. The carousel provides a cyclic motion allowing all mounted items to obtain a uniform application of PVD. Source inlets which provide the release of PVD material are located on the sides of the chamber.

Once attached to the frame of the carousel, the items are thoroughly cleaned and dried to remove any residue or contamination. The items are then inserted in batches into the PVD plants, after which the air is removed from the vacuum chamber until an atmospheric pressure of one hundred-millionths is reached. At this point, the deposition phase has begun. Once the process is complete, the frame containing the layered items is removed and the plant is prepared for the successive batch.

Deposition usually takes approximately one to three hours to complete. Among a number of factors, the main principle is the type of layer to be realised.

The temperature can vary from ambient levels up to 250°C for decorative finishes. Generally, processes used by X-PLATING require a temperature of between 90 and 100°C.

PVD technology has a reduced environmental impact as compared with other layering methodologies. In particular, the consumption of materials to create depositions and processing residues are extremely limited. In addition, there are no substances used which may present risks to the operators or the environment.

For each batch there are key parameters verified for adhesion and colour of the deposition. Items are furthermore checked individually to verify the absence of defects like blemishes and flaws before dispatch.

PVD is the acronym for Physical Vapour Deposition, a collective set of processes used to deposit thin layers of materials. It is a family of technologies which allows for the creation of surface layers on an object.

The first studies of phenomena based on PVD date back to the fourteenth century, while the first patent for industrial use was applied for by Thomas Edison in 1892.

PVD is a process of atomistc deposition in which materials are vapourised from a solid or liquid source in the form of atoms and molecules, and transported to an intended destination surface through a controlled setting at low pressure. Once the materials reach the target surface, they solidify to create a molecular bond of extremely durable quality.

To create coatings of thicknesses a few nanometres ‘nm’ (billionths of a metre) to a dozen or so micrometres (microns) ‘µm’. These deposits can consist of pure elements, alloys or composites. It is even possible to create multi-layered or graduated compositions.

Fields of application are diverse. The main uses are for the creation of films of increased durability, resistance to wear-and-tear and against corrosion for applications in manufacturing for the mechanical, aerospace and biomedical industries. PVD technologies are also used in the production of microchips, touch screens, lenses and energy-efficient glass. An emerging field of application includes decorative deposits with optimal properties to ensure mechanical resistance to wear.

PVD enables practically any element on the periodic table, solid at ambient temperature, to be deposited. For decorative applications, base materials including titanium, zirconium and chrome are used, given their intrinsic resistance characteristics to combat corrosion and associated mechanical wear.